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Electron Lithography |
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Electron Lithography & Metrology
The
SOFT-TEC lithography group has and constantly improves its profound
expertise and superior skills in modeling and simulation of electron
lithography and metrology including e-beam lithography, electron projection
lithography, SEM and TEM processes and procedures. The present group's
background allows to create and keep updated integrated software models for
investigation and optimization of electron lithography and metrology basing
on single electron Monte Carlo calculations. Our experience covers both
Gaussian and shaped beam configurations in direct write e-ebeam technique,
modeling SCALPEL column aberrations and space charge, various resist
platforms (positive/negative, conventional/chemically amplified) as well as
relevant methodologies and necessary techniques for proximity effect data
fit or extracting resist model parameters.
CapabilitiesElectron Lithography & Metrology Simulation