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Photolithography

The SOFT-TEC lithography group has and constantly improves its profound expertise and superior skills in modeling and simulation of optical lithography processes. The present group's background allows to create and keep updated a commercial quality software models for advanced photolithographic process development and manual design optimization. Our experience covers both mercury-lamp and DUV illumination sources with different resolution enhancement techniques (high NA steppers, phase-shift masks, off-axis illumination), various resist platforms (positive/negative, high-contrast/chemically amplified) as well as relevant methodologies and necessary techniques for determining relevant model parameters and automating routine engineering tasks.

Capabilities

Optical Lithography Simulation


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Last Updated: September 26, 2011 03:06 PM +0300