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Plasma Processing Modeling
Plasma-enhanced processes play a key role in the modern semiconductor technology. They are intensively used both for thin film deposition of metals, semiconductors, and dielectrics and for etching of the same materials. The effectiveness of any plasma-enhanced process depends strongly on proper process conditions which can be different for various materials. To optimize the process conditions for new materials in short time is a very challenge item.
It is well-known that only computer simulation can provide the technology with quick and correct acquisition of the optimal process conditions in a wide range. Such simulation software actually exist for plasma-enhanced processes. It is essential that the reliable simulation results can be obtained only if correct properties and characteristics of the relevant materials are used. For plasma-enhanced processes inelastic electron-atom, ion-atom, atom-atom, and electron-molecule collision cross-sections are of particular importance. An experimental measurement of such parameters is prohibitively time-consuming and expensive. The only alternative is to calculate the needed set of the cross-sections using contemporary quantum-mechanical approaches.
Our expertise and skills in the Plasma Processing Modeling area can provide our customers with time-efficient solutions for calculations of, for instance, the following collision cross-sections:
- inelastic electron-atom;
- ion-atom;
- atom-atom; and
- electron-molecule.
Based on our models we develop software, that allows to generate the full sets of electron-atom ionization/excitation cross-sections. The data calculated can also be coupled with the third-party plasma simulation software. We deal with atoms of both light and heavy elements, as well fluorine-contained molecules for which the ionization and dissociation cross section sets can be obtained both for the parent etchant molecules and for its degradation products.
Our results can be efficiently used in plasma-enhanced process simulation software as well for challenge researches such as an analysis of alternative etchants with low global warming gas emission. We also believe that they can be applied to astrophysical and fusion researches.