X-Ray Lithography 

The SOFT-TEC lithography group has a profound expertise and superior skills in developing advanced physical models for simulation of X-ray lithography. The present group's background allows to create an all-inclusive set of software models for investigation and optimization of X-ray lithographic processes. Our experience covers

• exposure systems (material properties of the mirrors and filters)
• angular and energy spectra of synchrotron radiation sources
• 2D/3D mask geometries
• complex chemical compositions of the mask, mirrors, filters, resist, substrate
• various resist platforms
• EUVL mask reflectivity with account for random variations of the mirror layer thicknesses

Capabilities

X-ray lithography Simulation.

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Last Updated: September 26, 2011 03:06 PM +0300